Special Issues/Surface Modification and Passivation of Materials by Ion Beams. Surface Modification and Ion Beam Technology.

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

The growth and modification of materials via ion–surface processing

A wide variety of gas phase ions with kinetic energies from 1–10 eV increasingly are being used for the growth and modification of state-of-the-art material interfaces. Ions can be used to deposit thin films; expose fresh interfaces by sputtering; grow mixed interface layers from ions, ambient neutrals, and/or surface atoms; modify the phases of interfaces; dope trace elements into interface re...

Michigan Ion Beam Laboratory FOR SURFACE MODIFICATION AND ANALYSIS

This report summarizes the principal research activities in the Michigan Ion Beam Laboratory during the past calendar year. Fifty-six researchers conducted thirty-one projects at MIBL that accounted for over 3200 hours of equipment usage. The programs included participation from researchers at the University, corporate research laboratories, private companies, government laboratories, and other...

Nanoscopic surface modification by slow ion bombardment

We present systematic scanning tunneling microscopy (STM)/atomic-force microscopic (AFM) investigations on nanoscopic defect production at atomically clean surfaces of SiO2, Al2O3 and highly oriented pyrolytic graphite (HOPG) after bombardment by slow (impact energy ≤ 1.2 keV) singly and multiply charged ions under strict ultra-high vacuum (UHV) conditions. Combined STM and AFM studies show tha...

Modification and nanostructuring of magnetic materials by ion irradiation